UV assisted chemical modification of photoresist
US6503693B1 · kind B1 · utility
23Cited by
7References
44Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1999 |
| Grant date | Jan 7, 2003 |
| Priority date | — |
| Expiry date | Dec 2, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/405
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for altering exposed and developed photoresist features. The photoresist features are exposed to at least one compound that will react with at least one of itself and at least one component of the photoresist. The reaction takes place in the presence of at least one component of the photoresist. The photoresist features are exposed to reaction-initiating energy during at least one time selected from the group consisting of prior to, simultaneous with and subsequent to exposing the photoresist features to the at least one compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.