Stage device, control system, and method for stabilizing wafer stage and wafer table
US6504162B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2000 |
| Grant date | Jan 7, 2003 |
| Priority date | — |
| Expiry date | Jun 28, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A wafer stage device and control system are provided to stabilize a wafer stage and a wafer table in a wafer manufacturing process. The wafer table supports the semiconductor wafer, while the wafer stage is accelerated in response to a wafer manufacturing control system to position the wafer table. The wafer stage device includes a set of flexures connecting the wafer table to the wafer stage. The flexures are positioned in a plane which is substantially in alignment with an upper surface of the wafer. The flexure's configuration causes a rotational error, such as pitching or rolling, of the wafer table as the wafer stage moves. The wafer stage device further includes a plurality of actuators to control the rotational error by exerting a stabilizing torque to the wafer table. The control system determines the stabilizing torque necessary to correct the pitching or rolling error of the wafer table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.