Method and apparatus for a reticle with purged pellicle-to-reticle gap
US6507390B1 · kind B1 · utility
20Cited by
5References
28Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 10, 2000 |
| Grant date | Jan 14, 2003 |
| Priority date | — |
| Expiry date | Feb 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system is described. A porous frame between a reticle and a pellicle maintains the purged optical gap. A porous frame includes a first and a second opposing surface. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. A gas supply interface infuses a purge gas through the porous frame and into the gap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.