System and method for facilitating selection of optimized optical proximity correction
US6510730B1 · kind B1 · utility
22Cited by
7References
17Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 31, 2000 |
| Grant date | Jan 28, 2003 |
| Priority date | — |
| Expiry date | Mar 31, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/881
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method for evaluating optical proximity corrected (OPC) designs is provided. The system includes an AFM measurement system for performing measurements relating to a segment of a feature pattern corresponding to a predetermined OPC mask feature. The measurement system is configured to determine a first image for the segment of the printed feature based upon the measurements. The measurement system compares the first image with another image corresponding to different OPC design to evaluate performance characteristics of the respective OPC designs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.