Polymers, resist compositions and patterning process
US6511787B2 · kind B2 · utility
14Cited by
4References
7Claims
0Family size
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Key dates
| Filing date | Sep 7, 2001 |
| Grant date | Jan 28, 2003 |
| Priority date | — |
| Expiry date | Sep 7, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.