Modular gas panel closet for a semiconductor wafer processing platform
US6523563B2 · kind B2 · utility
5Cited by
10References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2001 |
| Grant date | Feb 25, 2003 |
| Priority date | — |
| Expiry date | Feb 28, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/7062
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for providing facilities gas lines to a plurality of processing chambers. The apparatus comprises a rack having at least one modular gas control panel coupled thereon. A plurality of gas control panel feeds is coupled between the facilities gas lines and at least one gas control panel. Process gases are provided to individual chambers by a plurality of chamber gas lines are respectively coupled between at least one gas control panel and the plurality of processing chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.