Ion implanter and beam stop therefor
US6525327B1 · kind B1 · utility
9Cited by
3References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 12, 2000 |
| Grant date | Feb 25, 2003 |
| Priority date | — |
| Expiry date | Jan 1, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A beam stop (23) has a charge collecting member (40) which extends in the direction of scanning of a scanned beam by less than the total distance scanned, so that variation in the charge signal derived from the collecting member can provide a timing signal for use in monitoring alignment of the scanned beam. In a preferred embodiment, the beam stop plate (42) has slits (65-69) leading to apertures (60-64) containing charge collecting rods (73-75) located within the thickness of the beam stop plate (42).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.