John Ruffell
10Patents
6h-index
12Co-inventors
63Inventor score
Filing activity: Nov 29, 1978 → Feb 15, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5053627A | Apparatus for ion implantation | Electricity | 29 | Expired |
| US6179921A | Backside gas delivery system for a semiconductor wafer processing system | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6350097B1 | Method and apparatus for processing wafers | Emerging Cross-Sectional Technologies | 17 | Expired |
| US4812663A | Calorimetric dose monitor for ion implantation equipment | Physics | 16 | Expired |
| US6555832B1 | Determining beam alignment in ion implantation using Rutherford Back Scattering | Electricity | 16 | Expired |
| US6525327B1 | Ion implanter and beam stop therefor | Electricity | 9 | Expired |
| US6679675B2 | Method and apparatus for processing wafers | Emerging Cross-Sectional Technologies | 2 | Expired |
| US4307406A | Multistyli recording systems | Electricity | 2 | Expired |
| US8481959B2 | Apparatus and method for multi-directionally scanning a beam of charged particles | Electricity | 1 | Active |
| US8399851B2 | Systems and methods for scanning a beam of charged particles | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.