Stepper lens specific reticle compensation for critical dimension control
US6529623B1 · kind B1 · utility
4Cited by
8References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 31, 1999 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Aug 31, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70433
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In order to obviate the problem wherein localized lens aberration causes a pattern of low yield which cannot be corrected by conventional stepper correction/adjustment and which leads to the determination that the stepper lens is the source of the problem, the reticle is modified to produce an error which is selected to cancel the error that is being produced by the lens aberration and thus enable desired critical dimensions to produce on all dice. The modified reticle is then dedicated to the particular stepper.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.