Method and apparatus for application of proximity correction with relative segmentation
US6532585B1 · kind B1 · utility
8Cited by
11References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 14, 2000 |
| Grant date | Mar 11, 2003 |
| Priority date | — |
| Expiry date | May 9, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is a method and apparatus for applying one-dimensional proximity correction to a piece of a mask pattern, by segmenting a first piece of a mask pattern with horizontal dividing lines into a plurality of segments, segmenting a second piece of said mask pattern with said horizontal dividing lines into a second plurality of segments, and applying proximity correction to a first segment from said first plurality of segments taking into consideration a second segment from said second plurality of segments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.