Patent · US Expired

Vacuum processing apparatus and a vacuum processing system

US6537012B2 · kind B2 · utility

6Cited by
8References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 4, 2002
Grant dateMar 25, 2003
Priority date
Expiry dateMar 4, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/139
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The vacuum processing apparatus has an atmospheric loader having a plurality of cassette tables and a transport unit for carrying wafers, a vacuum loader equipped with vacuum wafer-processing chambers and a vacuum transport chamber communicating with the processing chambers via gate valves, and a locking unit provided with a loading lock chamber and unloading lock chambers that have gate valves for connecting the atmospheric transport unit and vacuum transport chamber; wherein two etching chambers, formed by UHF-ECR reactors, are arranged symmetrically with respect to an axial line passing through the middle of the vacuum transport chamber and locking unit, only at the opposite side of the locking unit across the vacuum transport chamber, and at an acute angle with respect to the vacuum transport chamber, and UHF-ECR antennas, almost parallel to the foregoing axial line, are opened at the opposite side to that of the vacuum transport chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.