Feature-based defect detection
US6539106B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 1999 |
| Grant date | Mar 25, 2003 |
| Priority date | — |
| Expiry date | Jan 8, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Methods and apparatus are provided for inspecting a patterned substrate, comprising: preparing a reference image and a test image, extracting features from the reference image and extracting features from the test image, matching features of the reference image and features of the test image; and comparing features of the reference image and of the test image to identify defects. Embodiments include apparatus for inspecting patterned substrates, computer-readable media containing instructions for controlling a system having a processor for inspecting patterned substrates, and computer program products comprising a computer usable media having computer-readable program code embodied therein for controlling a system for inspecting patterned substrates. The images can be electron-beam voltage-contrast images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.