Christopher G. Talbot
23Patents
15h-index
21Co-inventors
81Inventor score
Filing activity: Aug 16, 1982 → Jul 20, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6539106B1 | Feature-based defect detection | Electricity | 252 | Expired |
| US6252412A | Method of detecting defects in patterned substrates | Electricity | 227 | Expired |
| US6091249A | Method and apparatus for detecting defects in wafers | Physics | 178 | Expired |
| US5530372A | Method of probing a net of an IC at an optimal probe-point | Electricity | 123 | Expired |
| US5675499A | Optimal probe point placement | Electricity | 113 | Expired |
| US6504393B1 | Methods and apparatus for testing semiconductor and integrated circuit structures | Physics | 93 | Expired |
| US7253645B2 | Detection of defects in patterned substrates | Electricity | 72 | Expired |
| US6509750B1 | Apparatus for detecting defects in patterned substrates | Electricity | 67 | Expired |
| US5821549A | Through-the-substrate investigation of flip-chip IC's | Electricity | 55 | Expired |
| US5616921A | Self-masking FIB milling | Electricity | 54 | Expired |
| US5140164A | IC modification with focused ion beam system | Physics | 52 | Expired |
| US5401972A | Layout overlay for FIB operations | Electricity | 40 | Expired |
| US5144225A | Methods and apparatus for acquiring data from intermittently failing circuits | Physics | 24 | Expired |
| US5357116A | Focused ion beam processing with charge control | Physics | 17 | Expired |
| US6225626A | Through-the-substrate investigation of flip chip IC's | Electricity | 16 | Expired |
| US4510384A | Automatic focusing device with frequency weighted amplification | Physics | 10 | Expired |
| US6914441B2 | Detection of defects in patterned substrates | Electricity | 7 | Expired |
| US6518571B2 | Through-the-substrate investigation of flip-chip IC's | Electricity | 7 | Expired |
| US5959458A | Method and apparatus for measuring electrical waveforms using atomic force microscopy | Emerging Cross-Sectional Technologies | 4 | Expired |
| US9915621B2 | Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereof | Physics | 4 | Active |
| US7602197B2 | High current electron beam inspection | Physics | 3 | Expired |
| US10421125B2 | Controlling an intensity profile of an energy beam in additive manufacturing based on travel direction or velocity | Emerging Cross-Sectional Technologies | 0 | Active |
| US10307822B2 | Controlling an intensity profile of an energy beam with a deformable mirror in additive manufacturing | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.