Cleaning apparatus for plate-like part and method thereof
US6539959B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 4, 2000 |
| Grant date | Apr 1, 2003 |
| Priority date | — |
| Expiry date | Feb 4, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
At a time of cleaning a plate-like part such as a wafer or the like while rotating, for the purpose of reducing a contamination, a damage and an unevenness of process of the plate-like part which are caused by an amount of charged electricity of the plate-like part, chuck pins (chuck members) 201 which chuck the plate-like part 1 such as the wafer or the like and upper and lower cleaning plates 101 and 121 which oppose to the plate-like part 1 are constituted by a resin material containing carbon powders, and a desired potential difference is applied to a portion between the plate-like part and the cleaning plates by a voltage control unit 601 which is provided in an outer portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.