Patent · US Expired

Systems and methods for stitching overlapping swaths

US6540315B1 · kind B1 · utility

22Cited by
3References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 16, 2002
Grant dateApr 1, 2003
Priority date
Expiry dateJan 16, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06K2215/111
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

System and methods for using a fluid ejection system to distribute fluid drop density of a region between at least two overlapping swaths having pixels on a receiving medium. Using the method, overlapping swaths are stitched together by distributing a fluid ejection pattern between the overlapping swaths within the overlapped region. Because small drops of fluid can be distributed within a single region, the fluid ejection pattern can be controlled and intermediate density regions can be created by distributing the fluid of drops within a region between two fluid ejector heads or between two swaths of the same fluid ejector head. The distribution can be linear or non-linear. Furthermore, overlapping swaths are stitched together by randomly varying a stitch location within the overlapped region. In this case, a stitch location is randomly varied in the slow scan direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.