Resin useful for resist, resist composition and pattern forming process using the same
US6541597B2 · kind B2 · utility
10Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2001 |
| Grant date | Apr 1, 2003 |
| Priority date | — |
| Expiry date | Jun 21, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.