Patent · US Expired

Segmenting of processing system into wet and dry areas

US6551488B1 · kind B1 · utility

11Cited by
57References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 8, 2000
Grant dateApr 22, 2003
Priority date
Expiry dateDec 2, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/241
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method and apparatus for processing a substrate is described. In one aspect, a processing system is provided which includes a wet area and a dry area. In another aspect, a method comprises processing the substrate in the process cell. The substrate is transferred from the process cell to a dry module and then transferring the substrate to a drying area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.