Patent · US Expired

Exposure apparatus

US6552774B2 · kind B2 · utility

4Cited by

6References

25Claims

0Family size

Assignee

Canon Kabushiki Kaisha · JP

Inventors

Tomoharu Hase · Utsunomiya, JP
Yukio Yamane · Tokyo, JP
Yoshinori Miwa · Utsunomiya, JP

Key dates

Filing date	Dec 26, 2000
Grant date	Apr 22, 2003
Priority date	—
Expiry date	Dec 26, 2020

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70816
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An exposure apparatus for transferring a pattern onto an object. The apparatus includes an optical member constituting part of an optical system arranged between a light source and the object, a rotor having a hole extending in an axial direction thereof, the optical member being mounted in the hole, a stator, the rotor and the stator constituting a motor for rotating the optical member, and a non-contact bearing for supporting the rotor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.