Corrosion-resistant electrode structure for integrated circuit decoupling capacitors

US6555912B1 · kind B1 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Bruce Anthony Copeland · Wappingers Falls, US
• Rebecca Y. Gorrell · Lagrangeville, US
• Donald W. Scheider · Poughquag, US
• Mark A. Takacs · Poughkeepsie, US
• Kenneth J. Travis, Jr. · Newburgh, US
• Peter O. Ulanmo · Hopewell Junction, US
• Jun Wang · Nanjing, CN

Key dates

• Filing date: Oct 23, 2001
• Grant date: Apr 29, 2003
• Expiry date: Oct 23, 2021

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L2924/0002
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A corrosion resistant electrode structure for interconnecting a decoupling capacitor to a substrate is disclosed. In an exemplary embodiment of the invention, the electrode structure includes a first chromium layer formed upon the capacitor and a first nickel layer formed upon the first chromium layer. A noble metal conductive layer is then formed upon the first nickel layer and a second nickel layer is formed upon said noble metal conductive layer. The second nickel layer has a thickness which is greater than a thickness of the first nickel layer. A second chromium layer is then formed upon the nickel layer.