Method and apparatus for updating a manufacturing model based upon fault data relating to processing of semiconductor wafers
US6556959B1 · kind B1 · utility
15Cited by
18References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 12, 1999 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Jul 12, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a method and apparatus for performing automated development and updating of a manufacturing model for a manufacturing process. An initial manufacturing model is developed. Tolerances of the manufacturing model are expanded using additional production data. The manufacturing model is then re-developed using the expanded tolerances.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.