Method of fabricating an electrostatic chuck

US6557248B1 · kind B1 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Shamouil Shamouilian · San Jose, US
• Manoocher Birang · Los Gatos, US
• John F. Cameron · Los Altos, US
• Chandra Deshpandey · Los Angeles, US
• Alfred Goldspeil · Watsonville, US
• Ron Northrup · San Jose, US
• Semyon Sherstinsky · San Francisco, US
• Sasson Someth · Los Altos Hills, US

Key dates

• Filing date: May 29, 1998
• Grant date: May 6, 2003
• Expiry date: Feb 2, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T279/23
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A method of fabricating an electrostatic member 33 for holding a substrate 45 in a process chamber 80 containing erosive process gas. The method comprises the steps of forming an electrostatic member 33 comprising an insulator or dielectric layer 35 covering an electrically conductive layer, and shaping the electrostatic member 33 to form a dielectric covered electrode and an electrical connector 55 attached to the dielectric covered electrode 50 to conduct charge to the dielectric covered electrode 50.