Etching system and etching chamber

US6558506B1 · kind B1 · utility

Assignee

• TOKYO ELECTRON LIMITED · JP

Inventors

• Richard J. Freeman · Wenham, US
• Jay Wallace · Danvers, US
• Yoichi Kurono · Showa, JP
• Arthur Laflamme · Rowley, US
• Louise S. Barriss · North Reading, US
• Tadashi Onishi · Shizuoka, JP

Key dates

• Filing date: Oct 24, 2001
• Grant date: May 6, 2003
• Expiry date: Oct 24, 2021

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67196
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

The present invention provides an etching system having a plurality of etching chambers (16, 18, 20) disposed about a transfer chamber (14), wherein the etching chambers are adapted to be selectively mounted at different positions with respect to the transfer chamber.