Method of manufacturing micromechanical surface structures by vapor-phase etching

US6558559B1 · kind B1 · utility

Assignee

• Robert Bosch GmbH · DE

Inventors

• Volker Becker · Marxzell, DE
• Franz Laermer · Stuttgart, DE
• Michael Offenberg · Lörrach, DE
• Andrea Schilp · Schwäbisch Gmünd, DE

Key dates

• Filing date: Feb 5, 1998
• Grant date: May 6, 2003
• Expiry date: Feb 16, 2018

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C1/00
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method of sacrificial layer etching of micromechanical surface structures, in which a sacrificial layer is deposited on a heatable silicon substrate and is structured. A temperature difference between the substrate and the vapor phase of an etching medium is established in such a way that exposed metal contacts made of aluminum alloys are not attacked at the same time and are not subsequently exposed to any risk of corrosion.