Plasma energy control by inducing plasma instability
US6558564B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2000 |
| Grant date | May 6, 2003 |
| Priority date | — |
| Expiry date | Apr 5, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In the present invention, electron temperature is controlled by modifying the power delivered to the plasma by inducing or enhancing natural instabilities between the plasma and the power source. As a result, no pulse modulation of the RF power or RF generator is required. The instability is enhanced until the desired reduction in electron temperature has been achieved. In accordance with the invention, there are several modes for inducing such a natural instability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.