Peter Loewenhardt
59Patents
25h-index
107Co-inventors
87Inventor score
Filing activity: Oct 31, 1994 → Jul 7, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6352049B1 | Plasma assisted processing chamber with separate control of species density | Electricity | 419 | Expired |
| US6418874B1 | Toroidal plasma source for plasma processing | Electricity | 203 | Expired |
| US6558564B1 | Plasma energy control by inducing plasma instability | Electricity | 167 | Expired |
| US6189484A | Plasma reactor having a helicon wave high density plasma source | Electricity | 77 | Expired |
| US6841943B2 | Plasma processor with electrode simultaneously responsive to plural frequencies | Electricity | 75 | Expired |
| US6673199B1 | Shaping a plasma with a magnetic field to control etch rate uniformity | Electricity | 69 | Expired |
| US6471822B1 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Electricity | 67 | Expired |
| US6744212B2 | Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions | Electricity | 63 | Expired |
| US5753044A | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Electricity | 61 | Expired |
| US7601246B2 | Methods of sputtering a protective coating on a semiconductor substrate | Electricity | 49 | Active |
| US5900062A | Lift pin for dechucking substrates | Electricity | 49 | Expired |
| US5817534A | RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers | Emerging Cross-Sectional Technologies | 46 | Expired |
| US7244336B2 | Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift | Electricity | 46 | Expired |
| US6755150B2 | Multi-core transformer plasma source | Electricity | 39 | Expired |
| US6185839A | Semiconductor process chamber having improved gas distributor | Electricity | 39 | Expired |
| US6402885B2 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Electricity | 38 | Expired |
| US5779926A | Plasma process for etching multicomponent alloys | Electricity | 33 | Expired |
| US5451784A | Composite diagnostic wafer for semiconductor wafer processing systems | Electricity | 33 | Expired |
| US6030486A | Magnetically confined plasma reactor for processing a semiconductor wafer | Electricity | 31 | Expired |
| US5897712A | Plasma uniformity control for an inductive plasma source | Electricity | 29 | Expired |
| US7169231B2 | Gas distribution system with tuning gas | Electricity | 29 | Expired |
| US6085688A | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Electricity | 28 | Expired |
| US6071372A | RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls | Electricity | 28 | Expired |
| US6270687A | RF plasma method | Electricity | 27 | Expired |
| US7363876B2 | Multi-core transformer plasma source | Electricity | 27 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.