Patent · US Expired

System and method for measuring dimensions of a feature having a re-entrant profile

US6559446B1 · kind B1 · utility

4Cited by
1References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 27, 2000
Grant dateMay 6, 2003
Priority date
Expiry dateJul 4, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N23/225
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A system and method are disclosed for measuring and/or imaging a feature having a re-entrant cross-sectional profile. Beams are emitted onto the feature and substrate at different angles during corresponding measurement intervals. An feature data set of the feature is characterized for each measurement interval. The data associated with each measurement interval are aggregated to provide a cross-sectional representation of the having dimensions proportional to the feature. As a result, a more accurate feature profile may be determined, including a cross-sectional dimension of the re-entrant feature at the juncture between the feature and substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.