Plasma focus light source with tandem ellipsoidal mirror units
US6566668B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2001 |
| Grant date | May 20, 2003 |
| Priority date | — |
| Expiry date | Nov 26, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/06
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.