Exhaust system for vapor deposition reactor and method of using the same
US6572924B1 · kind B1 · utility
12Cited by
15References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 18, 1999 |
| Grant date | Jun 3, 2003 |
| Priority date | — |
| Expiry date | Nov 18, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An improved exhaust conductance system for a CVD reactor includes two exhaust paths and a three-way valve controlling flow to the exhaust paths. The valve directs flow through a first exhaust conductance path when reactant gas passes through the reactor, and through a second exhaust conductance path after reactant gas has been purged from the chamber and only purging gas is flowing through the reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.