Protective gas shield apparatus
US6576060B1 · kind B1 · utility
1Cited by
9References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 19, 2000 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | May 19, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45595
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas shield assembly for protecting an exposed surface of an injector in a chemical vapor deposition system. The shield assembly includes a back wall which supports perforated sheets to define a plenum. The sheets are held in place by endcaps. A conduit delivers gas to the plenum. The conduit includes a stretch extending along the back wall and has a bend adjacent the ends of the back wall. The conduit includes perforations along the stretch and at the bends to provide substantially uniform flow of gas into the plenum and the ends.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.