Antireflective porogens
US6576681B2 · kind B2 · utility
22Cited by
16References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2001 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Oct 11, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed are organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming electronic devices containing such porous organo polysilica dielectric materials without the use of antireflective coatings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.