Treatment solution supply apparatus and treatment solution supply method
US6578772B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2001 |
| Grant date | Jun 17, 2003 |
| Priority date | — |
| Expiry date | May 26, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention is a treatment solution supply apparatus for supplying a treatment solution onto a substrate and includes: a discharge nozzle for discharging the treatment solution onto the substrate; a container for storing the treatment solution; a supply piping for connecting the discharge nozzle and the container; a pump provided along the supply piping; a pump drive mechanism for controlling operation of the pump; a circulation piping having one end branching out from the piping between the container and the pump and another end provided at the pump; a filter, provided at some midpoint along the supply piping and between the one end and the other end of the circulation piping, for filtering the treatment solution to remove a foreign substance; a drain piping for draining the treatment solution filtered by the filter and containing the foreign substance; and a valve provided along the drain piping for controlling a flow rate of the treatment solution drained from the filter. According to the present invention, the treatment solution is supplied with part thereof being circulated through the circulation piping, so that the part of the treatment solution passes through the …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.