Method and apparatus for directing constituents through a processing chamber
US6586343B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 1999 |
| Grant date | Jul 1, 2003 |
| Priority date | — |
| Expiry date | Jul 9, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S118/90
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for directing a process gas through a processing apparatus, such as a vapor deposition chamber. The apparatus comprises a pumping plate for a processing chamber having an annular body member wherein said body member has a first portion and a second defining a circumferential edge and a central opening. The first portion comprises a sidewall of the circumferential edge having a plurality of circumferentially spaced through holes and the second portion has comprises a lateral portion that protrudes from the circumferential edge, such that, in a processing chamber, the first portion defines a first gas flow region comprising the central opening and a second gas flow region comprising the lateral portion of the second portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.