System and methods for classifying anomalies of sample surfaces
US6590645B1 · kind B1 · utility
12Cited by
4References
64Claims
0Family size
Assignee
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Key dates
| Filing date | May 4, 2000 |
| Grant date | Jul 8, 2003 |
| Priority date | — |
| Expiry date | May 4, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Two or more defect maps may be provided for the same sample surface at different detection sensitivities and/or processing thresholds. The defect maps may then be compared for better characterization of the anomalies as scratches, area anomalies or point anomalies. This can be done without concealing the more significant and larger size defects amongst numerous small and immaterial defects. One or more defect maps can be used to report the anomalies with classified information; the results from this map(s) can be used to monitor the process conditions to obtain better yield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.