Temperature controlled chamber
US6598559B1 · kind B1 · utility
536Cited by
26References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2000 |
| Grant date | Jul 29, 2003 |
| Priority date | — |
| Expiry date | Mar 24, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing chamber 25 comprising a substrate support 85, and a wall 24 about the substrate support 85, the wall 24 having a radiation absorbing surface 36 adapted to preferentially absorb radiation having wavelengths in the visible or infra-red spectrum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.