Method and apparatus for performing run-to-run control in a batch manufacturing environment
US6607926B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 1999 |
| Grant date | Aug 19, 2003 |
| Priority date | — |
| Expiry date | Aug 10, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides for a method and an apparatus for controlling manufacturing processes using a hierarchical system. A first lot of semiconductor devices is processed using a first set of control input parameters. The first set of control input parameters is stored in one of a plurality of hierarchical levels, the first set of control input parameters being available for processing of a second lot of semiconductor devices. Process data is acquired from the processing of the first lot of semiconductor devices. A second set of control input parameters is determined for a subsequent lot of semiconductor devices based upon the acquired process data. The second set of control input parameters is stored in one of a plurality of hierarchical levels, the first and second sets of control input settings being available for processing of a third lot of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.