Patent · US Expired

Method for making small pore for use in programmable resistance memory element

US6613604B2 · kind B2 · utility

423Cited by
7References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 2001
Grant dateSep 2, 2003
Priority date
Expiry dateSep 19, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/8828

Abstract

A method for making a small pore. The defined pore is useful for the fabrication of programmable resistance memory elements. The programmable resistance memory material may be a chalcogenide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.