Device for monitoring substrate charging and method of fabricating same
US6614051B1 · kind B1 · utility
17Cited by
8References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 10, 2002 |
| Grant date | Sep 2, 2003 |
| Priority date | — |
| Expiry date | May 10, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/34
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A charge monitoring device comprising one or more capacitor-resistor pairs. The one or more capacitor-resistor pairs comprise a resistor and a capacitor connected in series. The capacitor comprises a ferroelectric charge storage layer. A method of forming the charge storage device is also provided.The charge monitoring device may be used to measure charge accumulation on a semiconductor wafer. The method comprises the steps of positioning a charge monitoring device in a semiconductor wafer production chamber, initiating a manufacturing process in the chamber and measuring the charge accumulation on the charge monitoring device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.