Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck
US6625003B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2002 |
| Grant date | Sep 23, 2003 |
| Priority date | — |
| Expiry date | Nov 1, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02N13/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A bipolar electrostatic chuck containing apparatus, and a concomitant method, for balancing an electrostatic force that the bipolar electrostatic chuck imparts upon a workpiece. More specifically, the bipolar electrostatic chuck contains a chuck body having a pair of electrodes embedded therein, a primary power supply and an offset power supply. Each electrode within the bipolar electrostatic chuck is respectively connected to a terminal on the primary power. Based upon a voltage produced by the primary power supply and a bias voltage of the workpiece, an offset voltage is applied by the offset power supply to one of the terminals, thus balancing the electrostatic force applied to the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.