Method and apparatus for embedded substrate and system status monitoring
US6630995B1 · kind B1 · utility
51Cited by
54References
41Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 6, 2000 |
| Grant date | Oct 7, 2003 |
| Priority date | — |
| Expiry date | Dec 26, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/4704
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention generally provides an apparatus and a method for inspecting a substrate in a processing system. One embodiment provides a substrate inspection apparatus, comprising a vacuum chamber lid, the lid comprising a body defining at least three ports located to provide a field of view to a common area on a substrate transfer plane and light management system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.