Scanning exposure apparatus and method
US6633363B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 14, 2000 |
| Grant date | Oct 14, 2003 |
| Priority date | — |
| Expiry date | Sep 14, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scanning exposure apparatus and method for synchronously moving a mask and a substrate with respect to an exposing radiation flux to project an image of a mask pattern on the mask onto the substrate, includes an alignment sensor detecting the initial rotational angle of the mask relative to the substrate, a mask position detector, a substrate position detector, a calculation unit processing the position signals of the mask and the substrate in accordance with the projection ratio of the projection optical system and the initial rotational angle of the mask relative to the substrate to derive a positional deviation of the mask stage relative to the substrate stage, and a controller controlling the mask stage movement and the substrate stage movement to eliminate the positional deviation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.