Pulse oscillating gas laser device
US6639929B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 2001 |
| Grant date | Oct 28, 2003 |
| Priority date | — |
| Expiry date | Nov 14, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0388
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pulse oscillating gas laser device, which can reduce an influence of a shock wave caused by primary discharge and perform stable laser oscillation is provided. To this end, the device is a pulse oscillating gas laser device for exciting a laser gas by causing primary discharge in a pulse form between a pair of discharge electrodes (14, 15) opposing each other and oscillating laser light, in which a rib portion (42) with insulating properties for preventing creeping discharge is provided on a cathode base (36) with insulating properties, to which the discharge electrode (15) at a high voltage side is fixed, and a damping material (45) for attenuating a shock wave (41) caused by the primary discharge is inserted in an inside of a groove portion (52) between a raised portion (43) of the rib portion (42) and the high-voltage side discharge electrode (15).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.