Substrate processing using a member comprising an oxide of a group IIIB metal
US6641697B2 · kind B2 · utility
46Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2001 |
| Grant date | Nov 4, 2003 |
| Priority date | — |
| Expiry date | Nov 25, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/914
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An erosion resistant member that may be used in the processing of a substrate in a plasma of a processing gas, comprises at least a portion that may be exposed to the plasma of the processing gas and that contains more than about 3% by weight of an oxide of a Group IIIB metal. The portion may also further contain a ceramic compound selected from silicon carbide, silicon nitride, boron carbide, boron nitride, aluminum nitride, aluminum oxide, and mixtures thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.