Stabilized oscillator circuit for plasma density measurement
US6646386B1 · kind B1 · utility
21Cited by
45References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2002 |
| Grant date | Nov 11, 2003 |
| Priority date | — |
| Expiry date | Apr 25, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0081
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.