Surface inspection apparatus and surface inspection method
US6646735B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2001 |
| Grant date | Nov 11, 2003 |
| Priority date | — |
| Expiry date | Jan 28, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/9513
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A surface inspection apparatus determines an optimal apparatus condition setting at which a pattern layer is to be inspected based upon images of a test piece captured by an image-capturing device while irradiating illuminating light onto the surface of the test piece and varying an apparatus condition at which the images are captured. An optimal apparatus condition setting is determined by using images obtained before forming an uppermost pattern layer, an optimal apparatus condition setting is determined by using images obtained after the formation of the uppermost pattern layer and it is judged as to whether or not an image captured by the image-capturing device originates from the uppermost pattern based upon the plurality of optimal settings thus is ascertained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.