Process monitoring apparatus and method
US6652710B2 · kind B2 · utility
8Cited by
21References
88Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 1, 1999 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | Jun 1, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An apparatus capable of processing a wafer, comprises a chamber adapted to process the wafer, whereby one or more parameters of the process being conducted in the chamber may change during processing of the wafer; and a signal analyzer adapted to receive a plurality of input signals relating to the parameters and provide an output signal in relation to the input signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.