James P. Cruse
38Patents
10h-index
64Co-inventors
74Inventor score
Filing activity: Sep 5, 1995 → Nov 27, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8496756B2 | Methods for processing substrates in process systems having shared resources | Electricity | 501 | Active |
| US7955646B2 | Elimination of flow and pressure gradients in low utilization processes | Electricity | 362 | Active |
| US5910011A | Method and apparatus for monitoring processes using multiple parameters of a semiconductor wafer processing system | Electricity | 126 | Expired |
| US8513889B2 | Methods and apparatus for tuning matching networks | Electricity | 51 | Active |
| US7968469B2 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Electricity | 39 | Active |
| US6660659B1 | Plasma method and apparatus for processing a substrate | Electricity | 29 | Expired |
| US5925212A | Apparatus and method for attaining repeatable temperature versus time profiles for plasma heated interactive parts used in mass production plasma processing | Electricity | 24 | Expired |
| US7846497B2 | Method and apparatus for controlling gas flow to a processing chamber | Emerging Cross-Sectional Technologies | 23 | Active |
| US7775236B2 | Method and apparatus for controlling gas flow to a processing chamber | Emerging Cross-Sectional Technologies | 13 | Active |
| US8074677B2 | Method and apparatus for controlling gas flow to a processing chamber | Emerging Cross-Sectional Technologies | 11 | Active |
| US8845816B2 | Method extending the service interval of a gas distribution plate | Emerging Cross-Sectional Technologies | 8 | Active |
| US7605008B2 | Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma | Electricity | 8 | Active |
| US7645709B2 | Methods for low temperature oxidation of a semiconductor device | Electricity | 8 | Active |
| US6652710B2 | Process monitoring apparatus and method | Electricity | 8 | Expired |
| US7988815B2 | Plasma reactor with reduced electrical skew using electrical bypass elements | Electricity | 8 | Active |
| US8707754B2 | Methods and apparatus for calibrating flow controllers in substrate processing systems | Emerging Cross-Sectional Technologies | 8 | Active |
| US8992689B2 | Method for removing halogen-containing residues from substrate | Electricity | 8 | Active |
| US8076247B2 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Electricity | 7 | Active |
| US7879731B2 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Electricity | 7 | Active |
| US7552736B2 | Process for wafer backside polymer removal with a ring of plasma under the wafer | Electricity | 6 | Active |
| US7743670B2 | Method and apparatus for gas flow measurement | Emerging Cross-Sectional Technologies | 5 | Active |
| US8080479B2 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Electricity | 5 | Active |
| US7975558B2 | Method and apparatus for gas flow measurement | Emerging Cross-Sectional Technologies | 4 | Active |
| US7994872B2 | Apparatus for multiple frequency power application | Electricity | 4 | Active |
| US8237517B2 | Apparatus for multiple frequency power application | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.