Radiation sensitive silicon-containing negative resists and use thereof
US6653045B2 · kind B2 · utility
7Cited by
4References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2001 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | Aug 23, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative resist composition, comprising:(a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent,(b) an acid-sensitive crosslinking agent, and(c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.