Inspecting method and apparatus for repeated micro-miniature patterns
US6661912B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1998 |
| Grant date | Dec 9, 2003 |
| Priority date | — |
| Expiry date | Aug 3, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for inspecting foreign matter in repeated micro-miniature patterns formed upon a surface of an object to be inspected, comprising: an inspection light illuminating device for irradiating an inspection light directed upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; a scattered light detector for detecting scattered light of the inspection light being scattered upon the surface said object to be inspected; means for obtaining a first information related to a foreign matter attaching upon the surface of said object to be inspected, which is obtained on a basis of the detection of said scattered light by said scattered light detector; an illumination means for applying a bright field illumination upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; means for picking up the image of the foreign matter, under a bright field illumination by said illumination means; means for obtaining a second information related to said foreign matter, depending upon an image of said foreign matter, which is obtained on a basis of said picking up of the image by said image picking …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.