Dielectric barrier discharge apparatus and process for treating a substrate
US6664737B1 · kind B1 · utility
20Cited by
13References
21Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 21, 2002 |
| Grant date | Dec 16, 2003 |
| Priority date | — |
| Expiry date | Jun 21, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32009
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A dielectric barrier discharge apparatus for treating a substrate includes a first planar electrode; a dielectric layer disposed on a surface of the first planar electrode; a porous planar electrode spaced above and in a parallel plane with the dielectric layer, wherein the porous planar electrode has a geometric transmission factor greater than 70 percent; and a power supply in electrical communication with the first electrode and the second electrode. A process for treating a substrate includes exposing the substrate surface to reactants produced by the dielectric barrier discharge apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.