Projection exposure lens with aspheric elements

US6665126B2 · kind B2 · utility

Assignee

• Carl Zeiss Stiftung · DE

Inventors

• David Shafer · Fairfield, US
• Wilhelm Ulrich · Aalen, DE
• Helmut Beierl · Heidenheim, DE

Key dates

• Filing date: Dec 27, 2000
• Grant date: Dec 16, 2003
• Expiry date: Dec 27, 2020

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70241
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.